Micro-fabrication and high-productivity etching system for 65-nm node and beyond

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Application Technology Department, Semiconductor Equipment Business Group, Hitachi High-Technologies Corporation ^{[1
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Hitachi Rev. | 2006年 / 2卷 / 83-87期

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[17] Impact of boron penetration from S/D-extension on gate-oxide reliability for 65-nm node CMOS and beyond
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