Microsecond non-melt UV laser annealing for future 3D-stacked CMOS

被引：0
|
作者：
Tabata, Toshiyuki [1 ]
Rozé, Fabien [1 ]
Thuries, Louis [1 ]
Halty, Sebastien [1 ]
Raynal, Pierre-Edouard [1 ]
Huet, Karim [1 ]
Mazzamuto, Fulvio [1 ]
Joshi, Abhijeet [2 ]
Basol, Bulent M. [2 ]
Alba, Pablo Acosta [3 ]
Kerdilès, Sébastien [3 ]
机构：
[1] Laser Systems & Solutions of Europe (LASSE), 145 Rue Des Caboeufs, Gennevilliers,92230, France
[2] Active Layer Parametrics (ALP), 5500 Butler Lane, Scotts Valley,CA,95066, United States
[3] Université Grenoble Alpes, CEA-Leti, 17 Rue Des Martyrs, Grenoble,38054, France
来源：
Applied Physics Express | 2022年 / 15卷 / 06期
关键词：
537.1 Heat Treatment Processes - 701.1 Electricity: Basic Concepts and Phenomena - 714.2 Semiconductor Devices and Integrated Circuits - 744.1 Lasers; General;
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摘要：
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