Effect of acid generator decomposition during exposure on acid image quality of chemically amplified extreme ultraviolet resists

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Institute of Scientific and Industrial Research, Osaka University, Ibaraki, Osaka 567-0047, Japan [1 ]
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Jpn. J. Appl. Phys. | / 7 PART 1卷
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Compendex;
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摘要：
Quantum efficiency
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