Effect of acid generator decomposition during exposure on acid image quality of chemically amplified extreme ultraviolet resists

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Institute of Scientific and Industrial Research, Osaka University, Ibaraki, Osaka 567-0047, Japan ^{[1
]}

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来源：

Jpn. J. Appl. Phys. | / 7 PART 1卷

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Compendex;

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摘要：

Quantum efficiency

引用

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