Effects of processing parameters on the properties of tantalum nitride thin films deposited by reactive sputtering

被引：0
|
作者：
Nazon, J. [1 ]
Sarradin, J. [1 ]
Flaud, V. [1 ]
Tedenac, J.C. [1 ]
Fréty, N. [1 ]
机构：
[1] Institut Charles Gerhardt, UMR 5253 CNRS-UM2-ENSCM-UM1, cc 1504, Place E. Bataillon, 34095 Montpellier Cedex 5, France
来源：
Journal of Alloys and Compounds | 2008年 / 464卷 / 1-2期
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页码：526 / 531
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