Photosensitive materials based on copolymers of vinyl cyclopropyl ether with maleic anhydride

被引：0

作者：

Shakhnazarli, R.Z. ^{[1
]}

Alieva, A.A. ^{[1
]}

Nazaraliev, Kh.G. ^{[1
]}

Guliev, A.M. ^{[1
]}

机构：

[1] Institute of Polymeric Materials, National Academy of Sciences of Azerbaijan, Sumgaiyt, Azerbaijan

来源：

| 1600年 / Maik Nauka-Interperiodica Publishing卷 / 81期

关键词：

Copolymers prepared from vinyl cyclopropyl ether and maleic anhydride were modified with allyl alcohol; and the products obtained were thermally cross-linked with styrene. Photoresists were prepared from these copolymers; and their photolithographic parameters were determined. © 2008 MAIK Nauka;

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摘要：

Journal article (JA)

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[1] Photosensitive materials based on copolymers of vinyl cyclopropyl ether with maleic anhydride
R. Z. Shakhnazarli
A. A. Alieva
Kh. G. Nazaraliev
A. M. Guliev
Russian Journal of Applied Chemistry, 2008, 81 : 294 - 297
[2] Photosensitive materials based on copolymers of vinyl cyclopropyl ether with maleic anhydride
Shakhnazarli, R. Z.
Alieva, A. A.
Nazaraliev, Kh. G.
Guliev, A. M.
RUSSIAN JOURNAL OF APPLIED CHEMISTRY, 2008, 81 (02) : 294 - 297
[3] Equimolecular Copolymers of Maleic Anhydride with Isopropyl Vinyl Ether and Benzyl Vinyl Ether.
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[4] COPOLYMERS OF TERT-BUTYL VINYL ETHER WITH MALEIC OR CITRACONIC ANHYDRIDE
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[9] ELECTRON SENSITIVE RESISTS DERIVED FROM VINYL ETHER-MALEIC ANHYDRIDE COPOLYMERS
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