Odd aberration measurement technique based on peak intensity difference of aerial image

被引:0
|
作者
机构
[1] [1,Tu, Yuanying
[2] 1,Wang, Xiangzhao
[3] 1,Yan, Guanyong
来源
Wang, X. (wxz26267@siom.ac.cn) | 1600年 / Chinese Optical Society卷 / 33期
关键词
D O I
10.3788/AOS201333.0512002
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [1] Development of aerial image based aberration measurement technique
    Hagiwara, T
    Kondo, N
    Hiroshi, I
    Suzuki, K
    Magome, N
    [J]. Optical Microlithography XVIII, Pts 1-3, 2005, 5754 : 1659 - 1669
  • [2] In situ aberration measurement technique based on an aerial image with an optimized source
    Yan, Guanyong
    Wang, Xiangzhao
    Li, Sikun
    Yang, Jishuo
    Xu, Dongbo
    Duan, Lifeng
    Bourov, Anatoly Y.
    Erdmann, Andreas
    [J]. OPTICAL ENGINEERING, 2013, 52 (06)
  • [3] In-situ Aberration Measurement Technique Based on Aerial Image with Optimized Source
    Yan, Guanyong
    Wang, Xiangzhao
    Li, Sikun
    Yang, Jishuo
    Xu, Dongbo
    Duan, Lifeng
    Bourov, Anatoly Y.
    Erdmann, Andreas
    [J]. OPTICAL SYSTEMS DESIGN 2012, 2012, 8550
  • [4] In situ aberration measurement technique based on principal component analysis of aerial image
    Duan, Lifeng
    Wang, Xiangzhao
    Bourov, Anatoly Y.
    Peng, Bo
    Bu, Peng
    [J]. OPTICS EXPRESS, 2011, 19 (19): : 18080 - 18090
  • [5] Aberration measurement technique based on an analytical linear model of a through-focus aerial image
    Yan, Guanyong
    Wang, Xiangzhao
    Li, Sikun
    Yang, Jishuo
    Xu, Dongbo
    Erdmann, Andreas
    [J]. OPTICS EXPRESS, 2014, 22 (05): : 5623 - 5634
  • [6] Wavefront Aberration Measurement Technique Based on Principal Component Analysis of Aerial Image for Lithographic Projection Lens
    Lei Wei
    Li Sikun
    Pan Dongchao
    Jiang Yipeng
    Tong Tong
    Wang Xiangzhao
    Bu Yang
    [J]. ACTA OPTICA SINICA, 2023, 43 (13)
  • [7] Aerial image model and application to aberration measurement
    Burov, Anatoly Y.
    Li, Liang
    Yang, Zhiyong
    Wang, Fan
    Duan, Lifeng
    [J]. OPTICAL MICROLITHOGRAPHY XXIII, 2010, 7640
  • [8] Measurement technique for characterizing odd aberration of lithographic projection optics based on dipole illumination
    Peng, Bo
    Wang, Xiangzhao
    Qiu, Zicheng
    Yuan, Qiongyan
    [J]. OPTICS COMMUNICATIONS, 2010, 283 (11) : 2309 - 2317
  • [9] Trefoil aberration measurement of lithographic projection optics based on linewidth asymmetry of the aerial image
    Yuan, Qiongyan
    Wang, Xiangzhao
    Qiu, Zicheng
    [J]. OPTIK, 2010, 121 (19): : 1739 - 1742
  • [10] The Measurement of Liquid Level Based on Peak Image Recognition Technique
    Cao, Huidan
    Shen, Yuming
    [J]. MACHINE DESIGN AND MANUFACTURING ENGINEERING, 2012, 566 : 505 - 510