Aberration measurement technique based on an analytical linear model of a through-focus aerial image

被引：7

作者：

Yan, Guanyong ^{[1
,2
]}

Wang, Xiangzhao ^{[1
,2
]}

Li, Sikun ^{[1
]}

Yang, Jishuo ^{[1
,2
]}

Xu, Dongbo ^{[3
]}

Erdmann, Andreas ^{[3
]}

机构：

[1] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Lab Informat Opt & Optoelect Technol, Shanghai 201800, Peoples R China

[2] Univ Chinese Acad Sci, Beijing 100049, Peoples R China

[3] Fraunhofer Inst Integrated Syst & Device Technol, D-91058 Erlangen, Germany

来源：

OPTICS EXPRESS | 2014年 / 22卷 / 05期

基金：

中国国家自然科学基金;

关键词：

NIJBOER-ZERNIKE APPROACH; POINT-SPREAD FUNCTIONS; PHASE-SHIFTING MASK; LITHOGRAPHIC TOOLS; PROJECTION OPTICS; COMA MEASUREMENT; ILLUMINATION; COMPUTATION;

D O I：

10.1364/OE.22.005623

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We propose an in situ aberration measurement technique based on an analytical linear model of through-focus aerial images. The aberrations are retrieved from aerial images of six isolated space patterns, which have the same width but different orientations. The imaging formulas of the space patterns are investigated and simplified, and then an analytical linear relationship between the aerial image intensity distributions and the Zernike coefficients is established. The linear relationship is composed of linear fitting matrices and rotation matrices, which can be calculated numerically in advance and utilized to retrieve Zernike coefficients. Numerical simulations using the lithography simulators PROLITH and Dr.LiTHO demonstrate that the proposed method can measure wavefront aberrations up to Z(37). Experiments on a real lithography tool confirm that our method can monitor lens aberration offset with an accuracy of 0.7 nm. (C)2014 Optical Society of America

引用

页码：5623 / 5634

页数：12

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