Odd aberration measurement technique based on peak intensity difference of aerial image

被引：0
|
作者：
机构：
[1] [1,Tu, Yuanying
[2] 1,Wang, Xiangzhao
[3] 1,Yan, Guanyong
来源：
Wang, X. (wxz26267@siom.ac.cn) | 1600年 / Chinese Optical Society卷 / 33期
关键词：
D O I：
10.3788/AOS201333.0512002
中图分类号：
学科分类号：
摘要：
引用
下载
收藏
相关论文
共 50 条
  • [21] Aberration measurement based on principal component analysis of aerial images of optimized marks
    Yan, Guanyong
    Wang, Xiangzhao
    Li, Sikun
    Yang, Jishuo
    Xu, Dongbo
    OPTICS COMMUNICATIONS, 2014, 329 : 63 - 68
  • [22] Parity decomposition theory of full wavefront aberration measurement using the intensity differences of aerial images in microlithography
    Yashiki, Satoshi
    APPLIED OPTICS, 2015, 54 (17) : 5353 - 5363
  • [23] Turbulence Aberration Restoration Based on Light Intensity Image Using GoogLeNet
    Ma, Huimin
    Zhang, Weiwei
    Ning, Xiaomei
    Liu, Haiqiu
    Zhang, Pengfei
    Zhang, Jinghui
    PHOTONICS, 2023, 10 (03)
  • [24] In situ aberration measurement technique based on quadratic Zernike model
    Yang, Jishuo
    Wang, Xiangzhao
    Li, Sikun
    Duan, Lifeng
    Yan, Guanyong
    Xu, Dongbo
    Bourov, Anatoly Y.
    Erdmann, Andreas
    OPTICAL SYSTEMS DESIGN 2012, 2012, 8550
  • [25] Measurement technique on beam of laser near field intensity distributon based on CCD image
    Tian, Yinghua, 1600, Editorial Office of High Power Laser and Particle Beams (26):
  • [26] Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image
    Zhu, Boer
    Wang, Xiangzhao
    Li, Sikun
    Yan, Guanyong
    Shen, Lina
    Duan, Lifeng
    APPLIED OPTICS, 2016, 55 (12) : 3192 - 3198
  • [27] Polarization Aberration Measurement Method Based on Principal Component Analysis of Differential Aerial Images
    Meng Zejiang
    Li Sikun
    Wang Xiangzhao
    Bu Yang
    Yang Chaoxing
    Dai Fengzhao
    ACTA OPTICA SINICA, 2019, 39 (07)
  • [28] Aerial Image Measurement Technique for fast evaluation of 193 nm lithography masks
    Zibold, AM
    Scherübl, T
    Harnisch, W
    Brunner, R
    Greif, J
    METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XVIII, PTS 1 AND 2, 2004, 5375 : 1278 - 1285
  • [29] Shearographic NDT using dynamic stressing and peak image-intensity storage technique
    Hung, YY
    Luo, WD
    Wen, X
    Shang, HM
    PROCEEDINGS OF THE SEM IX INTERNATIONAL CONGRESS ON EXPERIMENTAL MECHANICS, 2000, : 56 - +
  • [30] Measurement of element normalized level difference of small building elements with intensity technique
    VTT Publications, (262): : 3 - 31
12345