Simulation and deposition of Tungsten oxide (WO3) films using DC sputtering towards UV photodetector for high responsivity

被引：0
|
作者：
G, Nithya [1 ,2 ]
Naveen Kumar, Kilari [3 ,4 ]
Shaik, Habibuddin [3 ,5 ]
Reddy, Sudheer [6 ]
Sen, Prosenjit [1 ]
Guru Prakash, Nunna [7 ]
Ansari, Mushtaq Ahmad [8 ]
机构：
[1] Center for Nano Science and Engineering, Indian Institute of Science, Bengaluru,560012, India
[2] Department of Electronics and Communication Engineering, Nitte Meenakshi Institute of Technology, Yelahanka, Bengaluru,560064, India
[3] Department of Physics, Nitte Meenakshi Institute of Technology, Yelahanka, Bengaluru,560064, India
[4] Centre for Nanomaterials and MEMS, Nitte Meenakshi Institute of Technology, Yelahanka, Bengaluru,560064, India
[5] Department of Physics, Vignan's Foundation for Science, Technology and Research, Vadlamudi, Guntur,522213, India
[6] Department of Mechanical Engineering, Nitte Meenakshi Institute of Technology, Yelahanka, Bengaluru,560064, India
[7] School of Mechanical Engineering, Yeungnam University, 280 Daehak-ro, Gyeongsangbuk-do, Gyoungsan-si,38541, Korea, Republic of
[8] Department of Pharmacology and Toxicology, College of Pharmacy, King Saud University, P.O. Box 2457, Riyadh,11451, Saudi Arabia
来源：
Physica B: Condensed Matter | 2024年 / 695卷
关键词：
Compendex;
D O I：
10.1016/j.physb.2024.416555
中图分类号：
学科分类号：
摘要：
Magnetron sputtering - Oxide films - Photodetectors
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