Smooth layer for reducing roughness of EUV/soft x-ray multilayer substrate

被引：0
|
作者：
Zhang, Li-Chao
Jin, Chun-Shui
机构：
[1] State Key Lab. of Applied Optics, Changchun Institute of Optics and Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China
[2] Graduate School, Chinese Academy of Sciences, Beijing 100039, China
来源：
Weixi Jiagong Jishu/Microfabrication Technology | 2007年 / 03期
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摘要：
8
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页码：27 / 29
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