Online monitoring the discharging products of SF6 with photoelectron ionization mass spectrometry

被引:0
|
作者
Tang, Bin [1 ]
Zhao, Wu-Duo [2 ]
Zhu, Li-Ping [1 ]
Hou, Ke-Yong [2 ]
Huang, Yun-Guang [1 ]
Li, Hai-Yang [2 ]
机构
[1] Electric Power Research Institute, Guangxi Power Grid Corporation, Nanning,530023, China
[2] Dalian Institute of Chemical Physics, Chinese Academy of Sciences, Dalian,116023, China
关键词
Gas chromatography - SF6 insulation - Electric circuit breakers - Electric substations - Electric switchgear - Partial discharges - Photoelectrons - Gases - Ionization of gases - Mass spectrometry - Byproducts - Gas plants - HVDC power transmission - Infrared spectroscopy - Photons;
D O I
10.7538/zpxb.2015.36.05.0454
中图分类号
学科分类号
摘要
Sulfur hexafluoride (SF6) is a gas used in electrical substations at electric power plants as an insulator in circuit breakers and switchgear. SF6 gas can generate a variety of decomposed products due to discharge or overheat inside the high-voltage devices. The discharging fault inside of the electric device insulated by SF6 is closely related to the composition and content of SF6 gas discharge products. Some of the byproducts are active and unstable, which create difficulties on testing them and have to be analyzed through a variety of testing methods. Gas chromatography, gas chromatography-mass spectrometry and infrared spectrometry have been developed to rapidly analyze the discharge products, but these methods are time-consuming and very hard to realize the in situ analysis and on-line diagnostics. An online monitoring system for discharging products of SF6 with photoelectron ionization (PEI) time-of-flight mass spectrometry was developed in this paper. It can be used for diagnosis of discharging fault inside of the electric device by real-time monitoring for discharging products of SF6. The mass spectrum of SF6 gas discharge products and the kinetics were investigated using a gas discharging study with home-made low direct current voltage system. The main byproducts of SO2F2, SOF2, SO2 and SF4 can be clearly detected. This method is expected to provide the power production field with online mass spectrometry monitoring and track the fault inside of the SF6 electrical equipment on its running condition. ©, 2015, Chinese Society for Mass Spectrometry. All right reserved.
引用
下载
收藏
页码:454 / 459
相关论文
共 50 条
  • [31] ELECTRON-ATTACHMENT AND ELECTRON-IMPACT IONIZATION OF SF6 AND SF6/AR CLUSTERS
    STAMATOVIC, A
    SCHEIER, P
    MARK, TD
    JOURNAL OF CHEMICAL PHYSICS, 1988, 88 (11): : 6884 - 6888
  • [32] Ultra-Trace Analysis Technique for SF6 Using Gas Chromatography with Negative Ion Chemical Ionization Mass Spectrometry
    Jong, Edmund C.
    Macek, Paul V.
    Perera, Inoka E.
    Luxbacher, Kray D.
    McNair, Harold M.
    JOURNAL OF CHROMATOGRAPHIC SCIENCE, 2015, 53 (06) : 854 - 859
  • [33] NEGATIVE-ION ELECTROSPRAY MASS-SPECTROMETRY OF NUCLEOTIDES - IONIZATION FROM WATER SOLUTION WITH SF6 DISCHARGE SUPPRESSION
    WAMPLER, FM
    BLADES, AT
    KEBARLE, P
    JOURNAL OF THE AMERICAN SOCIETY FOR MASS SPECTROMETRY, 1993, 4 (04) : 289 - 295
  • [34] Calculation of the Discharging parameters of SF6/N2 Mixtures
    Li, Luwei
    Lin, Xin
    Li, Xintao
    2016 CHINA INTERNATIONAL CONFERENCE ON ELECTRICITY DISTRIBUTION (CICED), 2016,
  • [35] Probability of breakdown in SF6 gas and its discharging random mode
    Chen, Qingguo
    Zhang, Qiaogen
    Wang, Feng
    Qiu, Yuchang
    Wei, Xinlao
    Gaoya Dianqi/High Voltage Apparatus, 2000, 36 (06): : 15 - 19
  • [36] Surface reactions of SF6 decomposition products
    Piemontesi, M
    Niemeyer, L
    IEEE 1996 ANNUAL REPORT - CONFERENCE ON ELECTRICAL INSULATION AND DIELECTRIC PHENOMENA, VOLS I & II, 1996, : 585 - 593
  • [37] The geometric structure of pure SF6 and mixed Ar/SF6 clusters investigated by core level photoelectron spectroscopy
    Lindblad, A.
    Winkler, M.
    Tchaplyguine, M.
    Ohrwall, G.
    Svensson, S.
    Bjorneholm, O.
    SURFACE SCIENCE, 2009, 603 (03) : 433 - 436
  • [38] Threshold electron impact ionization of SF6 molecule
    A. N. Zavilopulo
    O. B. Shpenik
    A. V. Snegursky
    F. F. Chipev
    V. S. Vukstich
    Technical Physics Letters, 2005, 31 : 785 - 787
  • [39] Threshold electron impact ionization of SF6 molecule
    Zavilopulo, AN
    Shpenik, OB
    Snegursky, AV
    Chipev, FF
    Vukstich, VS
    TECHNICAL PHYSICS LETTERS, 2005, 31 (09) : 785 - 787
  • [40] Monitoring the quality of SF6 in gas insulated switchgear using ion mobility spectrometry
    Soppart, O
    Baumbach, JI
    Trindade, E
    Alberti, SM
    Silva, JMME
    Klockow, D
    Peier, D
    EUROPEAN TRANSACTIONS ON ELECTRICAL POWER, 2000, 10 (03): : 179 - 184