Preparation of silicon nanopillars array using gold nanoparticles as etching mask

The regular and uniform nanopillar arrays exhibit potential applications for nano-devices. The uniform gold nano-particle monolayer is formed on silicon substrate by self-assembly and the silicon nanopillar arrays were fabricated by reactive ion etching using gold nano-particles monolayer as etching mask, and the influence of the etch time on the silicon nanopillar arrays was investigated. If the etch time is too long, the over-etching is produced. When the time is less than 120 s, a large area silicon nanopillar or nanocone array can be obtained which their diameter is less than 20 nm and their aspect ratio is larger than 10. The results provide a simple, economic and effective method for fabrication of uniform nanopillar arrays on silicon substrate.