Morphological instabilities in thin-film growth and etching

被引：0

作者：

Cahill, David G. ^{[1
]}

机构：

[1] Dept. of Mat. Sci. and Engineering, Frederick Seitz Materials Res. Lab., University of Illinois, Urbana, IL 61801, United States

来源：

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | 2003年 / 21卷 / 5 SUPPL.期

关键词：

Ion-induced viscosity - Linear stability analysis - Thermal diffusion constant - Thin-film growth;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

(Edited Abstract)

引用

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