Gallium nitride nanorods fabricated by inductively coupled plasma reactive ion etching

被引：0
|
作者：
Yu, Chang-Chin [1 ]
Chu, Chen-Fu [1 ]
Tsai, Juen-Yen [1 ]
Huang, Hung Wen [1 ]
Hsueh, Tao-Hung [1 ]
Lin, Chia-Feng [1 ]
Wang, Shing-Chung [1 ]
机构：
[1] Inst. of Electro-Optical Engineering, National Chiao Tung University, Hsinchu, Taiwan
来源：
| 1600年 / Japan Society of Applied Physics卷 / 41期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [21] Reactive ion etching of gallium nitride by methylchloride/hydrogen
    Dineen, M
    Thomas, H
    Humphreys, B
    McMeekin, SG
    ELECTRONICS LETTERS, 1999, 35 (08) : 673 - 675
  • [22] Modeling of deep reactive ion etching by inductively coupled plasma with string algorithm
    Department of Applied Physics, Hefei University of Technology, Hefei 230009, China
    Zhenkong Kexue yu Jishu Xuebao, 2008, 5 (481-485):
  • [23] Fast smoothing on diamond surface by inductively coupled plasma reactive ion etching
    Yuting Zheng
    Jinlong Liu
    Ruoying Zhang
    Aude Cumont
    Jue Wang
    Junjun Wei
    Chengming Li
    Haitao Ye
    Journal of Materials Research, 2020, 35 : 462 - 472
  • [24] Fabrication of GaN hexagonal cones by inductively coupled plasma reactive ion etching
    Liu, Zhe
    Wang, Yujin
    Xia, Xiaoxiang
    Yang, Haifang
    Li, Junjie
    Gu, Changzhi
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2016, 34 (04):
  • [25] Fast smoothing on diamond surface by inductively coupled plasma reactive ion etching
    Zheng, Yuting
    Liu, Jinlong
    Zhang, Ruoying
    Cumont, Aude
    Wang, Jue
    Wei, Junjun
    Li, Chengming
    Ye, Haitao
    JOURNAL OF MATERIALS RESEARCH, 2020, 35 (05) : 462 - 472
  • [26] Investigation of Fabricated Through Glass Via (TGV) Process by Inductively Coupled Plasma Reactive Ion Etching of Quartz Glass
    Tang, Yu-Hsiang
    Lin, Yu-Hsin
    Huang, Tsung-Tao
    Wang, Jun-Sheng
    Shiao, Ming-Hua
    Yu, Chih-Sheng
    2015 IEEE 10TH INTERNATIONAL CONFERENCE ON NANO/MICRO ENGINEERED AND MOLECULAR SYSTEMS (NEMS), 2015, : 401 - 404
  • [27] Etching of Pyrex glass substrates by inductively coupled plasma reactive ion etching for micro/nanofluidic devices
    Jung, Hyun Chul
    Lu, Wu
    Wang, Shengnian
    Lee, L. James
    Hu, Xin
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2006, 24 (06): : 3162 - 3164
  • [28] Inductively coupled plasma-reactive ion etching for β-FeSi2 film
    Wakayama, T.
    Suemasu, T.
    Yamazaki, M.
    Kanazawa, T.
    Akinaga, H.
    THIN SOLID FILMS, 2007, 515 (22) : 8166 - 8168
  • [29] The structural and optical properties of black silicon by inductively coupled plasma reactive ion etching
    Steglich, Martin
    Kaesebier, Thomas
    Zilk, Matthias
    Pertsch, Thomas
    Kley, Ernst-Bernhard
    Tuennermann, Andreas
    JOURNAL OF APPLIED PHYSICS, 2014, 116 (17)
  • [30] Simple method for fabrication of diamond nanowires by inductively coupled plasma reactive ion etching
    Wakui, Kentaro
    Yonezu, Yuya
    Aoki, Takao
    Takeoka, Masahiro
    Semba, Kouichi
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2017, 56 (05)
12345