Design of multilayer extreme-ultraviolet mirrors for enhanced reflectivity

被引:0
|
作者
Singh, Mandeep [1 ]
Braat, Joseph J.M. [1 ]
机构
[1] Optics Research Group, Faculty of Applied Sciences, Delft University of Technology, Lorentzweg 1, 2628 CJ Delft, Netherlands
来源
Applied Optics | 2000年 / 39卷 / 13期
关键词
D O I
10.1364/ao.39.002189
中图分类号
学科分类号
摘要
26
引用
收藏
页码:2189 / 2197
相关论文
共 50 条
  • [31] IN-SITU REFLECTANCE MEASUREMENTS OF SOFT-X-RAY EXTREME-ULTRAVIOLET MO/Y MULTILAYER MIRRORS
    MONTCALM, C
    SULLIVAN, BT
    DUGUAY, S
    RANGER, M
    STEFFENS, W
    PEPIN, H
    CHAKER, M
    OPTICS LETTERS, 1995, 20 (12) : 1450 - 1452
  • [32] Damage to extreme-ultraviolet Sc/Si multilayer mirrors exposed to intense 46.9-nm laser pulses
    Grisham, M
    Vaschenko, G
    Menoni, CS
    Rocca, JJ
    Pershyn, YP
    Zubarev, EN
    Voronov, DL
    Sevryukova, VA
    Kondratenko, VV
    Vinogradov, AV
    Artioukov, IA
    OPTICS LETTERS, 2004, 29 (06) : 620 - 622
  • [33] NORMAL INCIDENCE MULTILAYER MIRRORS FOR EXTREME ULTRAVIOLET ASTRONOMY
    STERN, RA
    HAISCH, BM
    JOKI, EG
    CATURA, RC
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1984, 445 : 347 - 357
  • [34] MOLYBDENUM-SILICON MULTILAYER MIRRORS FOR THE EXTREME ULTRAVIOLET
    BARBEE, TW
    MROWKA, S
    HETTRICK, MC
    APPLIED OPTICS, 1985, 24 (06): : 883 - 886
  • [35] Attosecond dispersion control by extreme ultraviolet multilayer mirrors
    Hofstetter, Michael
    Schultze, Martin
    Fiess, Markus
    Dennhardt, Benjamin
    Guggenmos, Alexander
    Gagnon, Justin
    Yakovlev, Vladislav S.
    Goulielmakis, Eleftherios
    Kienberger, Reinhard
    Gullikson, Eric M.
    Krausz, Ferenc
    Kleineberg, Ulf
    OPTICS EXPRESS, 2011, 19 (03): : 1767 - 1776
  • [36] Nonlinear Behavior of Decrease in Reflectivity of Multilayer Mirrors for Extreme Ultraviolet Lithography Optics by High-Flux Extreme Ultraviolet Irradiation in Various Vacuum Environments
    Niibe, Masahito
    Koida, Keigo
    Kakutani, Yukinobu
    Nakayama, Takahiro
    Terashima, Shigeru
    Miyake, Akira
    Kubo, Hiroyoshi
    Matsunari, Shuichi
    Aoki, Takashi
    Kawata, Shintaro
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2011, 50 (06)
  • [37] EXTREME-ULTRAVIOLET INTERFEROMETRY AT 15.5 NM USING MULTILAYER OPTICS
    DASILVA, LB
    BARBEE, TW
    CAUBLE, R
    CELLIERS, P
    CIARLO, D
    MORENO, JC
    MROWKA, S
    TREBES, JE
    WAN, AS
    WEBER, F
    APPLIED OPTICS, 1995, 34 (28): : 6389 - 6392
  • [38] High-wavelength-resolution extreme-ultraviolet multilayer mirror
    Nagata, S
    Tsuneta, S
    Sakao, T
    Yoshida, T
    Hara, H
    Kano, R
    Ishiyama, W
    Murakami, K
    Ohtan, M
    APPLIED OPTICS, 1997, 36 (13): : 2830 - 2838
  • [39] Synchrotron beamline for extreme-ultraviolet multilayer mirror endurance testing
    Tarrio, C
    Grantham, S
    REVIEW OF SCIENTIFIC INSTRUMENTS, 2005, 76 (05):
  • [40] THE DESIGN AND OPTIMIZATION OF RECOMBINATION EXTREME-ULTRAVIOLET LASERS
    EPSTEIN, R
    PHYSICS OF FLUIDS B-PLASMA PHYSICS, 1989, 1 (01): : 214 - 220