Design of multilayer extreme-ultraviolet mirrors for enhanced reflectivity

被引:0
|
作者
Singh, Mandeep [1 ]
Braat, Joseph J.M. [1 ]
机构
[1] Optics Research Group, Faculty of Applied Sciences, Delft University of Technology, Lorentzweg 1, 2628 CJ Delft, Netherlands
来源
Applied Optics | 2000年 / 39卷 / 13期
关键词
D O I
10.1364/ao.39.002189
中图分类号
学科分类号
摘要
26
引用
收藏
页码:2189 / 2197
相关论文
共 50 条
  • [21] Ultrahigh vacuum deposition reflectometer system for the in situ investigation of Y/Mo extreme-ultraviolet multilayer mirrors
    Montcalm, C
    Sullivan, BT
    Ranger, M
    Pepin, H
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1997, 15 (06): : 3069 - 3081
  • [22] Molybdenum-strontium multilayer mirrors for the 8-12-nm extreme-ultraviolet wavelength region
    Sae-Lao, B
    Montcalm, C
    OPTICS LETTERS, 2001, 26 (07) : 468 - 470
  • [24] Evaluation of extreme-ultraviolet lithography mask absorber pattern on multilayer phase defect using extreme-ultraviolet microscope
    Hamamoto, K.
    Sakaya, N.
    Hosoya, M.
    Kureishi, M.
    Ohkubo, R.
    Shoki, T.
    Nagarekawa, O.
    Kishimoto, J.
    Watanabe, T.
    Kinoshita, H.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2009, 27 (04): : 1938 - 1942
  • [25] Analysis of multilayer structure for reflection of extreme-ultraviolet wavelength
    Lee, SY
    Hur, SM
    Kim, HJ
    Yoon, CS
    Lee, YT
    Kang, IY
    Chung, YC
    Yi, M
    Bok, CK
    Kim, O
    Ahn, J
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2002, 41 (6B): : 4086 - 4090
  • [26] Analysis of multilayer structure for reflection of extreme-ultraviolet wavelength
    Lee, Seung Yoon
    Hur, Sung Min
    Kim, Hyung Joon
    Yoon, Chong Seung
    Lee, Young Tae
    Kang, In Yong
    Chung, Yong-Chae
    Yi, Moonsuk
    Bok, Cheol Kyu
    Kim, Ohyun
    Ahn, Jinho
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2002, 41 (6 B): : 4086 - 4090
  • [27] Advances in multilayer reflective coatings for extreme-ultraviolet lithography
    Folta, JA
    Bajt, S
    Barbee, TW
    Grabner, RF
    Mirkarimi, PB
    Nguyen, T
    Schmidt, MA
    Spiller, E
    Walton, CC
    Wedowski, M
    Montcalm, C
    EMERGING LITHOGRAPHIC TECHNOLOGIES III, PTS 1 AND 2, 1999, 3676 : 702 - 709
  • [28] Capping layers for extreme-ultraviolet multilayer interference coatings
    Singh, M
    Braat, JJM
    OPTICS LETTERS, 2001, 26 (05) : 259 - 261
  • [29] Compression of attosecond harmonic pulses by extreme-ultraviolet chirped mirrors
    Morlens, AS
    Balcou, P
    Zeitoun, P
    Valentin, C
    Laude, V
    Kazamias, S
    OPTICS LETTERS, 2005, 30 (12) : 1554 - 1556
  • [30] Design of an extreme-ultraviolet attosecond compressor
    Poletto, Luca
    Frassetto, Fabio
    Villoresi, Paolo
    JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS, 2008, 25 (07) : B133 - B136