Waveguide mechanism and design of thermal contact resistance at metal rheologic interface

被引：0
|
作者：
Hu, Shi-Cheng [1 ]
Huang, Ming-Hui [1 ]
Li, Xiao-Qian [1 ]
Zhong, Jue [1 ]
机构：
[1] Coll. of Mech. and Elec. Eng., Central South Univ., Changsha 410083, China
来源：
Transactions of Nonferrous Metals Society of China (English Edition) | 2003年 / 13卷 / 03期
关键词：
Free electron - Metal rheologic interface - Oxide film - Thermal contact resistance - Waveguide mechanism;
D O I：
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中图分类号：
学科分类号：
摘要：
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页码：579 / 584
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