XPS of SiCN thin films prepared by C+ implantation in amorphous SiNx:H

被引：0
|
作者：
Chen, Chao [1 ]
Liu, Yuzhen [1 ]
Dong, Lijun [2 ]
Chen, Dapeng [2 ]
Wang, Xiaobo [1 ]
机构：
[1] Graduate University, Chinese Academy of Sciences, Beijing 100049, China
[2] Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
来源：
Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors | 2007年 / 28卷 / 03期
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学科分类号：
摘要：
14
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页码：415 / 419
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