Optical Characterization of Amorphous Hydrogenated Carbon(a-C:H)Thin Films Prepared by Single RF Plasma Method

被引：0
|
作者：
Dogan MANSUROGLU [1 ]
Kadir GOKSEN [2 ]
Sinan BILIKMEN [1 ]
机构：
[1] Physics Department,Middle East Technical University
[2] Physics Department,Duzce University
来源：
Plasma Science and Technology | 2015年 / 17卷 / 06期
关键词：
a-C:H thin film; plasma deposition; methane plasma; sp~3/sp~2 ratio;
D O I：
暂无
中图分类号：
O484.1 [薄膜的生长、结构和外延]; O539 [等离子体物理的应用];
学科分类号：
摘要：
Methane(CH4) plasma was used to produce amorphous hydrogenated carbon(aC:H) films by a single capacitively coupled radio frequency(RF) powered plasma system.The system consists of two parallel electrodes:the upper electrode is connected to 13.56 MHz RF power and the lower one is connected to the ground.Thin films were deposited on glass slides with different sizes and on silicon wafers.The influence of the plasma species on film characteristics was studied by changing the plasma parameters.The changes of plasma species during the deposition were investigated by optical emission spectroscopy(OES).The structural and optical properties were analyzed via Fourier transform infrared(FTIR) spectroscopy,X-ray diffraction(XRD) and UV-visible spectroscopy,and the thicknesses of the samples were measured by a profilometer.The sp3/sp2ratio and the existing H atoms play a significant role in the determination of the chemical properties of thin films in the plasma.The film quality and deposition rate were both increased by raising the power and the flow rate.
引用
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页码：488 / 495
页数：8
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