Impact of bias on the graphite-like carbon films grown by high power impulse magnetron sputtering

被引：0
|
作者：
Zhang, Xueqian [1 ,2 ]
Huang, Meidong [1 ]
Ke, Peiling [2 ]
Wang, Aiying [2 ]
机构：
[1] Tianjin Normal University, Tianjin 300387, China
[2] Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China
来源：
Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology | 2013年 / 33卷 / 10期
关键词：
Magnetron sputtering;
D O I：
10.3969/j.issn.1672-7126.2013.10.03
中图分类号：
学科分类号：
摘要：
引用
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页码：969 / 974
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