Impact of bias on the graphite-like carbon films grown by high power impulse magnetron sputtering

被引:0
|
作者
Zhang, Xueqian [1 ,2 ]
Huang, Meidong [1 ]
Ke, Peiling [2 ]
Wang, Aiying [2 ]
机构
[1] Tianjin Normal University, Tianjin 300387, China
[2] Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China
关键词
Magnetron sputtering;
D O I
10.3969/j.issn.1672-7126.2013.10.03
中图分类号
学科分类号
摘要
引用
收藏
页码:969 / 974
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