Silicon carbon nitride thin film produced by hot-filament chemical vapor deposition

被引：0
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作者：
Zhao, Wu [1 ]
Qu, Ya-Dong [1 ]
Zhang, Zhi-Yong [1 ]
Yun, Jiang-Ni [1 ]
Fan, Ding-Ding [1 ]
机构：
[1] Information Science and Technical Institute, Northwest University, Xi'an 710127, China
来源：
Zhongnan Daxue Xuebao (Ziran Kexue Ban)/Journal of Central South University (Science and Technology) | 2010年 / 41卷 / 01期
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页码：156 / 160
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