Chemical stability of embedded material for attenuated phase-shifting mask and application of high-transmittance attenuated phase-shifting mask for 0.1 μm contact pattern in 193 nm lithography

被引：0
|
作者：
Lin, Cheng-Ming [1 ,2 ]
Loong, Wen-An [1 ]
机构：
[1] E-Beam Operation Division, Taiwan Semiconductor Manufacturing Company, Ltd., Science-Based Industrial Park, Hsin-Chu 300, Taiwan
[2] Institute of Applied Chemistry, National Chiao Tung University, Hsin-Chu 300, Taiwan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2002年 / 41卷 / 6 B期
关键词：
Chemical stability;
D O I：
10.1143/jjap.41.4037
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：4037 / 4041
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