Large-area growth of in-plane oriented (112¯0) ZnO films by linear cathode magnetron sputtering

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作者：
OMRON Corporation, Kizugawa, Kyoto 619-0283, Japan [1 ]
不详 [2 ]
不详 [3 ]
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来源：
Jpn. J. Appl. Phys. | / 7 PART 2卷
关键词：
712.1 Semiconducting Materials - 714.2 Semiconductor Devices and Integrated Circuits - 802.3 Chemical Operations - 804.2 Inorganic Compounds;
D O I：
07HD16
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17
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