SIMS of Organic Materials—Interface Location in Argon Gas Cluster Depth Profiles Using Negative Secondary Ions

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[1] Havelund, R.
[2] Seah, M.P.
[3] Tiddia, M.
[4] Gilmore, I.S.
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Havelund, R. (rasmus.havelund@npl.co.uk) | 1600年 / Springer Science and Business Media, LLC卷 / 29期
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