Remote NF3 plasma processes for CVD chamber cleans

被引：0
|
作者：
Lester, M.A.
机构：
来源：
Semiconductor International | 2001年 / 24卷 / 11期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] Characterization of NF3 chamber cleans on multiple CVD platforms
    Goolsby, B
    Vartanian, V
    Mendicino, L
    Rivers, J
    Vires, J
    Soyemi, A
    Sun, SP
    Turner, M
    Esher, C
    ENVIRONMENTAL ISSUES WITH MATERIALS AND PROCESSES FOR THE ELECTRONICS AND SEMICONDUCTOR INDUSTRIES V, 2002, 2002 (15): : 127 - 138
  • [2] PFC emissions reduction and process improvements with remote plasma CVD chamber cleans
    Mendicino, L
    Brown, PT
    Filipiak, S
    Nauert, C
    Estep, H
    Fletcher, M
    ENVIRONMENTAL ISSUES WITH MATERIALS AND PROCESSES FOR THE ELECTRONICS AND SEMICONDUCTOR INDUSTRIES V, 2002, 2002 (15): : 144 - 156
  • [3] Environmentally friendly wafer production:: NF3 remote microwave plasma for chamber cleaning
    Reichardt, H
    Frenzel, A
    Schober, K
    MICROELECTRONIC ENGINEERING, 2001, 56 (1-2) : 73 - 76
  • [4] Impact of fluorine from NF3 based chamber cleaning processes
    Brown, PT
    Mendicino, L
    Vartanian, V
    ENVIRONMENTAL ISSUES IN THE ELECTRONICS AND SEMICONDUCTOR INDUSTRIES, 1999, 99 (08): : 52 - 59
  • [5] Power dependence of NF3 plasma stability for in situ chamber cleaning
    Ji, B
    Elder, DL
    Yang, JH
    Badowski, PR
    Karwacki, EJ
    JOURNAL OF APPLIED PHYSICS, 2004, 95 (08) : 4446 - 4451
  • [6] Remote plasma etching of titanium nitride using NF3/argon and chlorine mixtures for chamber clean applications
    Hellriegel, Ronald
    Albert, Matthias
    Hintze, Bernd
    Winzig, Hubert
    Bartha, J. W.
    MICROELECTRONIC ENGINEERING, 2007, 84 (01) : 37 - 41
  • [7] Insights to scaling remote plasma sources sustained in NF3 mixtures
    Huang, Shuo
    Volynets, Vladimir
    Hamilton, James R.
    Lee, Sangheon
    Song, In-Cheol
    Lu, Siqing
    Tennyson, Jonathan
    Kushner, Mark J.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2017, 35 (03):
  • [8] Calculated cross sections for electron collisions with NF3, NF2 and NF with applications to remote plasma sources
    Hamilton, James R.
    Tennyson, Jonathan
    Huang, Shuo
    Kushner, Mark J.
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2017, 26 (06):
  • [9] Using a Remote Plasma Source for n-Type Plasma Doping Chamber Cleans
    Srivastava, A.
    Wilson, A.
    Koo, I.
    2014 20TH INTERNATIONAL CONFERENCE ON ION IMPLANTATION TECHNOLOGY (IIT 2014), 2014,
  • [10] NF3 PLASMA TREATMENT OF POLYMERIC DIELECTRICS
    LU, HY
    PETRICH, MA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1992, 10 (03): : 450 - 454
12345