Investigating line-edge roughness in calixarene fine patterns using Fourier analysis

被引：0
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作者：
Ishida, Masahiko [1 ]
Kobayashi, Kenji [1 ]
Fujita, Jun-Ichi [2 ]
Ochiai, Yukinori [2 ]
Yamamoto, Hiromasa [2 ]
Tono, Seiji [1 ]
机构：
[1] NEC, Fundamental Research Laboratories, 34 Miyukigaoka, Tsukuba 305-8501, Japan
[2] Tsukuba Research Laboratories, Tokuyama Corp., 40 Wadai, Tsukuba 300-4247, Japan
来源：
| 1600年 / Japan Society of Applied Physics卷 / 41期
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页码：4228 / 4232
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