共 50 条
- [32] The Effect of Substrate Temperature on the Structure and Morphology of Titanium Nitride Compounds Grown by DC Magnetron Sputtering Journal of Fusion Energy, 2011, 30 : 333 - 337
- [33] Cubic boron nitride thin film deposition by unbalanced magnetron sputtering and dc pulsed substrate biasing JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1998, 16 (03): : 1331 - 1335
- [36] Deposition of titanium nitride film on Mg-Li alloys by DC reactive magnetron sputtering ADVANCED RESEARCH ON INDUSTRY, INFORMATION SYSTEMS AND MATERIAL ENGINEERING, PTS 1-7, 2011, 204-210 : 1685 - 1690
- [37] Nitrogen Emission in Reactive Magnetron Sputtering Plasmas During the Deposition of Titanium Nitride Thin Film INTERNATIONAL CONFERENCE ON PLASMA SCIENCE AND APPLICATIONS (ICPSA2016), 2017, 1824
- [38] Studies of the discharge properties of unbalanced magnetron sputtering system SURFACE & COATINGS TECHNOLOGY, 2005, 193 (1-3): : 46 - 49
- [39] Morphology and physical properties of titanium nitride films deposited by magnetron sputtering at room temperature Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology, 2005, 25 (04): : 297 - 300
- [40] Influence of substrates on the properties of titanium nitride films deposited by DC reaction magnetron sputtering APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2018, 124 (08):