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- [24] Influence of the H2O content and the time on the formation of nanostructures in a chemical solution of H2O/HF/NH4F/EG INTERNATIONAL MEETING ON APPLIED SCIENCES AND ENGINEERING, 2018, 1126
- [26] EFFECTS OF PREDEPOSITION HF/NH4F TREATMENTS ON THE ELECTRICAL-PROPERTIES OF SIO2/SI STRUCTURES FORMED BY LOW-TEMPERATURE PLASMA-ASSISTED OXIDATION AND DEPOSITION PROCESSES JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (04): : 945 - 951
- [28] PHOTOSTIMULATED EVAPORATION OF SIO2 AND SI3N4 FILMS BY SYNCHROTRON RADIATION AND ITS APPLICATION FOR LOW-TEMPERATURE CLEANING OF SI SURFACES JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1991, 9 (05): : 2653 - 2661
- [30] On Wet Etching of n-Si (100) Coated with Sparse Ag-Particles in Aqueous NH4F with the Aid of H2O2 INTERNATIONAL JOURNAL OF ELECTROCHEMICAL SCIENCE, 2012, 7 (04): : 2947 - 2964