Preparation and evaluation of w03-bi2o3 composite thin films

被引:0
|
作者
Nakagawa, Koichi [1 ]
Miura, Noboru [1 ]
Matsumoto, Setsuko [1 ]
Nakano, Ryotaro [1 ]
Matsumoto, Hironaga [1 ]
机构
[1] Department of Science and Technology, Meiji University, 1-1-1 Higashimita, Tama-ku, Kawasaki 214-8571, Japan
关键词
Composite films - Light absorption - Oxide films - X ray diffraction - Amorphous films - Bismuth compounds - Reactive sputtering - X ray photoelectron spectroscopy - Tungsten compounds - Film preparation;
D O I
10.3131/jvsj2.52.159
中图分类号
学科分类号
摘要
Tungsten oxide/bismuth oxide composite thin films prepared by multi target radio frequency (RF) reactive sputtering were investigated. X-ray diffraction measurements of the crystallinity of thin films prepared at room temperature revealed amorphous structure. Although the compositional ratio of composite thin films prepared at 50 W and 75 W of the RF power of the Bi target was almost the same, those prepared at 50 W were transparent, and had a much smaller optical absorption coefficient at 3.0 eV than those prepared at 75 W. Bi 4f spectra of these thin films were measured by X-ray photoelectron spectroscopy, and were analyzed by full width at half maximum of Bi 4f7/2 peaks. As a result, the transparency is thought to be caused by the change of bonding state of Bi-O. Electrochromic properties of the composite thin films were also measured in 0.1 M H2SO4. Coloration of composite thin films prepared at 20 W of the RF power of the Bi target changed reversibly from transparent to black and brown.
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页码:159 / 162
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