Effects of H2 addition in magnetized inductively coupled C2F6 plasma etching of silica aerogel film

被引：0
|
作者：
Wang, Seok-Joo [1 ]
Park, Hyung-Ho [1 ]
Yeom, Geun-Young [1 ]
机构：
[1] Yonsei Univ, Seoul, Korea, Republic of
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 2000年 / 39卷 / 12期
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摘要：
9
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页码：7007 / 7010
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