Process- and optoelectronic-control of NiOx thin films deposited by reactive high power impulse magnetron sputtering

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[1] [1,2,Keraudy, Julien
[2] Delfour-Peyrethon, Brice
[3] Ferrec, Axel
[4] 2,Garcia Molleja, Javier
[5] Richard-Plouet, Mireille
[6] Payen, Christophe
[7] Hamon, Jonathan
[8] Corraze, Benoît
[9] Goullet, Antoine
[10] Jouan, Pierre-Yves
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| 1600年 / American Institute of Physics Inc.卷 / 121期
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