CuO films deposited by superimposed high power impulse and DC magnetron sputtering

被引：3

作者：

Semenov, V. A. ^{[1
]}

Grenadyorov, A. S. ^{[1
]}

Oskirko, V. O. ^{[1
]}

Zakharov, A. N. ^{[1
]}

Rabotkin, S. V. ^{[1
]}

Ionov, I. V. ^{[1
]}

Solovyev, A. A. ^{[1
]}

机构：

[1] RAS, SB, Inst High Current Elect, 2-3 Akad Sky Ave, Tomsk 634055, Russia

来源：

14TH INTERNATIONAL CONFERENCE GAS DISCHARGE PLASMAS AND THEIR APPLICATIONS | 2019年 / 1393卷

关键词：

OXIDE THIN-FILMS; OPTICAL-PROPERTIES; PERFORMANCE; GROWTH; PHASE;

D O I：

10.1088/1742-6596/1393/1/012127

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

Copper oxide films have been successfully deposited onto glass, fused quartz and Si(100) substrates by superimposed high power impulse (HIPIMS) and DC reactive magnetron sputtering. The deposition rate, adhesion, structure, wettability and optical properties of the obtained films were compared with those of CuO films deposited by conventional DC sputtering. X-ray diffraction analysis revealed that nanocrystallite size, single phase cupric oxide thin films with monoclinic structure were formed in all deposition modes. However, superimposing the direct current during off-time of HiPIMS pulsing allowed formation of denser film with smooth surface and good optical properties.

引用

页数：9

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