Fe deposition or implantation into vacuum arc deposited Cr films

被引：0

作者：

Heck, Claire ^{[1
]}

Chayahara, Akiyoshi ^{[1
]}

Horino, Yuji ^{[1
]}

Miranda, Rosalvo M.N. ^{[2
,3
]}

Miranda, Marines M. ^{[3
]}

Baibich, Mario N. ^{[3
]}

机构：

[1] NIAIST, AIST Kansai, Lab. of Purified Materials, Ikeda, Osaka 563-8577, Japan

[2] Centro Universitario FEEVALE, Novo Hamburgo, RS, Brazil

[3] Instituto de Fisica, Univ. Federal do Rio Grande do Sul, Porto Alegre, RS, Brazil

来源：

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2003年 / 42卷 / 7 A期

关键词：

Chromium - Decomposition - Giant magnetoresistance - Iron - Multilayers - Silica - Substrates - Thin films - Transmission electron microscopy - Vacuum applications - X ray diffraction analysis;

D O I：

10.1143/jjap.42.4457

中图分类号：

学科分类号：

摘要：

The cylindrical cathode vacuum arc deposition method is used to produce pure Cr films on SiO2/Si(100) substrates. Deposition and implantation of Fe into the films were performed to study the influence of these processes on the structure of Cr. X-ray diffraction and cross-sectional transmission electron microscopy analyses are performed to establish the effects of spinodal decomposition in these materials.

引用

页码：4457 / 4458

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