Fe deposition or implantation into vacuum arc deposited Cr films

被引：0
|
作者：
Heck, Claire [1 ]
Chayahara, Akiyoshi [1 ]
Horino, Yuji [1 ]
Miranda, Rosalvo M.N. [2 ,3 ]
Miranda, Marines M. [3 ]
Baibich, Mario N. [3 ]
机构：
[1] NIAIST, AIST Kansai, Lab. of Purified Materials, Ikeda, Osaka 563-8577, Japan
[2] Centro Universitario FEEVALE, Novo Hamburgo, RS, Brazil
[3] Instituto de Fisica, Univ. Federal do Rio Grande do Sul, Porto Alegre, RS, Brazil
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2003年 / 42卷 / 7 A期
关键词：
Chromium - Decomposition - Giant magnetoresistance - Iron - Multilayers - Silica - Substrates - Thin films - Transmission electron microscopy - Vacuum applications - X ray diffraction analysis;
D O I：
10.1143/jjap.42.4457
中图分类号：
学科分类号：
摘要：
The cylindrical cathode vacuum arc deposition method is used to produce pure Cr films on SiO2/Si(100) substrates. Deposition and implantation of Fe into the films were performed to study the influence of these processes on the structure of Cr. X-ray diffraction and cross-sectional transmission electron microscopy analyses are performed to establish the effects of spinodal decomposition in these materials.
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页码：4457 / 4458
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