共 50 条
- [42] SUCCESSORS OF ARF WATER-IMMERSION LITHOGRAPHY: EUV LITHOGRAPHY, MULTI-E-BEAM MASKLESS LITHOGRAPHY, OR NANOIMPRINT? JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2008, 7 (04):
- [43] Defectivity Process Optimization on Immersion Topcoat less Resist Stacks ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXVI, 2009, 7273
- [44] CHARACTERIZATION AND IMPROVEMENT OF IMMERSION PROCESS DEFECTIVITY IN MEMORY DEVICE MANUFACTURING 2015 China Semiconductor Technology International Conference, 2015,
- [45] Current status of water immersion lithography and prospect of higher index method EMLC 2007: 23RD EUROPEAN MASK AND LITHOGRAPHY CONFERENCE, 2007, 6533
- [46] The effect of water-contact and evaporation on the roughness of photoresist for immersion lithography ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XXIII, PTS 1 AND 2, 2006, 6153 : U796 - U804
- [48] Point-of-use Ultra-Pure Water for immersion lithography 2006 IEEE/SEMI ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE AND WORKSHOP, 2006, : 238 - +
- [49] Approaching the numerical aperture of water - Immersion lithography at 193nm OPTICAL MICROLITHOGRAPHY XVII, PTS 1-3, 2004, 5377 : 273 - 284
- [50] Hyper NA water immersion lithography at 193 nm and 248 nm JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2004, 22 (06): : 3439 - 3443