Defectivity in water immersion lithography

被引：0
|
作者：
机构：
[1] Okoroanyanwu, Uzodinma
[2] Kye, Jongwook
[3] Yamamoto, Norihiro
[4] Cummings, Kevin
来源：
Okoroanyanwu, U. (uzo.oko@amd.com) | 2005年 / PennWell Publishing Co.卷 / 14期
关键词：
Lithography;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [21] Enhanced Cleaning for the Point-of-Use Filter and its Effectiveness on Wafer Defectivity in Immersion ArF Lithography Process
    Varanasi, Rao
    Umeda, Toru
    Mesawich, Michael
    Connor, Patrick
    Johnson, Lawrence
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2017, 30 (06) : 639 - 643
  • [22] Defectivity reduction by optimization of 193-nm immersion lithography using an interfaced exposure-track system
    Carcasi, Michael
    Hatakeyama, Shinichi
    Nafus, Kathleen
    Moerman, Richard
    van Dommelen, Youri
    Huisman, Peter
    Hooge, Joshua
    Scheer, Steven
    Foubert, Philippe
    ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XXIII, PTS 1 AND 2, 2006, 6153 : U1338 - U1345
  • [23] Immersion lithography
    Arnold, WH
    JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS, 2004, 3 (01): : 8 - 8
  • [24] Novel wafer bevel treatment for water immersion lithography
    Terai, Mamoru
    Ishibashi, Takeo
    Hagiwara, Takuya
    Hanawa, Tetsuro
    Kumada, Teruhiko
    Takebe, Yoko
    Yokokoji, Osamu
    Fujiwara, Tomoharu
    Jiang, Jianhai
    Niwa, Takafumi
    Wakamizu, Shinya
    Kyouda, Hideharu
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2008, 21 (05) : 665 - 672
  • [25] Immersion lithography
    Mack, CA
    MICROLITHOGRAPHY WORLD, 2004, 13 (02): : 14 - +
  • [26] Influences of water on photoresist surface in immersion lithography technology
    Sado, M.
    Teratani, T.
    Fujii, H.
    Iikawa, R.
    Iida, H.
    APPLIED SURFACE SCIENCE, 2008, 255 (04) : 1018 - 1021
  • [27] Materials and process parameters on ArF immersion defectivity study
    Kanna, Shinichi
    Inabe, Haruki
    Yamamoto, Kei
    Fukuhara, Toshiaki
    Tarutani, Shinji
    Kanda, Hiromi
    Wada, Kenji
    Kodama, Kunihiko
    Shitabatake, Koji
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2006, 19 (05) : 593 - 599
  • [28] Materials and process parameters on ArF immersion defectivity study
    Kanna, Shinichi
    Inabe, Haruki
    Yamamoto, Kei
    Fukuhara, Toshiaki
    Tarutani, Shinji
    Kanda, Hiromi
    Kenji, Wada
    Kodama, Kunihiko
    Shitabatake, Koji
    ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XXIII, PTS 1 AND 2, 2006, 6153 : U193 - U202
  • [29] Challenges and Progress in Defectivity for Advanced ArF Lithography Process
    Tango, Naohiro
    Yamamoto, Kei
    Shirakawa, Michihiro
    Ou, Keiyu
    Goto, Akiyoshi
    Fujita, Mitsuhiro
    Shiraishi, Yasuharu
    Fujimori, Toru
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2019, 32 (03) : 445 - 448
  • [30] Defectivity performance of full field immersion photolithography tool
    Nakano, Katsushi
    Nagaoka, Shirou
    Owa, Soichi
    Malik, Irfan
    Yamamoto, Tetsuya
    2006 IEEE/SEMI ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE AND WORKSHOP, 2006, : 30 - +
12345