A study of structural effects on the focusing and imaging performance of hard X-rays with 20-30 nm zone plates

被引:1
|
作者
Tong, Xujie [1 ]
Dhamgaye, Vishal [2 ]
Chen, Qiucheng [1 ]
Wu, Qingxin [1 ]
Deng, Biao [3 ]
Zhang, Ling [3 ]
Fox, Oliver [2 ]
Wang, Hongchang [2 ]
Zhao, Jun [1 ,3 ]
Chen, Yifang [1 ]
Xu, Zijian [3 ]
Li, Peng [2 ]
Sawhney, Kawal [2 ]
机构
[1] Fudan Univ, Sch Informat Sci & Technol, Shanghai Key Lab Metasurfaces Light Manipulat, Nanolithog & Applicat Res Grp, Shanghai 200433, Peoples R China
[2] Diamond Light Source Ltd, Harwell Sci & Innovat Campus, Didcot OX11 0DE, Oxon, England
[3] Chinese Acad Sci, Shanghai Adv Res Inst, Shanghai Synchrotron Radiat Facil, Shanghai 201210, Peoples R China
基金
中国国家自然科学基金;
关键词
zone plates; zone structural effects; focusing efficiency; X-ray microscopy; beam-propagation method; NANOFABRICATION;
D O I
10.1107/S1600577524009615
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Hard X-ray microscopes with 20-30 nm spatial resolution ranges are an advanced tool for the inspection of materials at the nanoscale. However, the limited efficiency of the focusing optics, for example, a Fresnel zone plate (ZP) lens, can significantly reduce the power of a nanoprobe. Despite several reports on ZP lenses that focus hard X-rays with 20 nm resolution - mainly constructed by zone-doubling techniques - a systematic investigation into the limiting factors has not been reported. We report the structural effects on the focusing and imaging efficiency of 20-30 nm-resolution ZPs, employing a modified beam-propagation method. The zone width and the duty cycle (zone width/ring pitch) were optimized to achieve maximum efficiency, and a comparative analysis of the zone materials was conducted. The optimized zone structures were used in the fabrication of Pt-hydrogen silsesquioxane (HSQ) ZPs. The highest focusing efficiency of the Pt-HSQ-ZP with a resolution of 30 nm was 10% at 7 keV and >5% in the range 6-10 keV, whereas the highest efficiency of the Pt-HSQ-ZP with a resolution of 20 nm was realized at 7 keV with an efficiency of 7.6%. Optical characterization conducted at X-ray beamlines demonstrated significant enhancement of the focusing and imaging efficiency in a broader range of hard X-rays from 5 keV to 10 keV, demonstrating the potential application in hard X-ray focusing and imaging.
引用
收藏
页码:1457 / 1463
页数:7
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