Impact of rapid thermal processing on oxygen precipitation in heavily arsenic and antimony doped Czochralski silicon

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机构：
[1] Zhang, Xinpeng
[2] Gao, Chao
[3] Fu, Maosen
[4] Ma, Xiangyang
[5] Vanhellemont, Jan
[6] Yang, Deren
来源：
Ma, X. (mxyoung@zju.edu.cn) | 1600年 / American Institute of Physics Inc.卷 / 113期
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