Internal modification of ultra thin silicon wafer by permeable pulse laser

被引：9
|
作者：
Ohmura, Etsuji
Kumagai, Masayoshi
Fukumitsu, Kenshi
Nakano, Makoto
Uchiyama, Naoki
Morita, Hideki
机构：
来源：
Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering | 2008年 / 74卷 / 03期
关键词：
D O I：
10.2493/jjspe.74.275
中图分类号：
学科分类号：
摘要：
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页码：275 / 281
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