Characterization of carbon thin films prepared by high power impulse magnetron sputtering

被引：0
|
作者：
机构：
[1] Nawachi, Norio
[2] Itoh, Koichi
[3] Isagi, Yosuke
[4] Yoshida, Yoshiaki
[5] Okamoto, Keishi
[6] Nakatani, Tatsuyuki
来源：
| 1600年 / Vacuum Society of Japan卷 / 60期
关键词：
Amorphous carbon (a-C) - Carbon thin films - Chamber pressure - High power impulse magnetron sputtering (HIPIMS) - Multipolar magnetic plasma confinement - Peak power densities - Substrate bias voltages - Tetrahedral amorphous carbon (ta-C);
D O I：
10.3131/jvsj2.60.341
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