Effects of trivalent lanthanide (La and Nd) doped ceria abrasives on chemical mechanical polishing

被引：0
|
作者：
Kim, Eungchul [1 ]
Lee, Jaewon [1 ]
Bae, Chulwoo [2 ]
Seok, Hyunho [2 ]
Kim, Hyeong-U [3 ]
Kim, Taesung [1 ,2 ]
机构：
[1] School of Mechanical Engineering, Sungkyunkwan University, Suwon,16419, Korea, Republic of
[2] SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University, Suwon,16419, Korea, Republic of
[3] Plasma Engineering Laboratory, Korea Institute of Machinery and Materials (KIMM), Daejeon,34103, Korea, Republic of
来源：
Powder Technology | 2022年 / 397卷
关键词：
Compendex;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Rare earth elements
引用
收藏
相关论文
共 50 条
  • [41] Design of composite abrasives and substrate materials for chemical mechanical polishing applications
    Fanning Meng
    Zhenyu Zhang
    Peili Gao
    Tingting Liu
    Yash Boyjoo
    Dongming Guo
    Applied Nanoscience, 2020, 10 : 1379 - 1393
  • [42] Research on Abrasives in the Chemical Mechanical Polishing Process for Silicon Nitride Balls
    YUAN Ju-long
    厦门大学学报(自然科学版), 2002, (S1) : 63 - 64
  • [43] Mullite-based abrasives for chemical mechanical polishing of silicon carbide
    Xu, Hanqi
    Li, Dexiang
    Wang, Zhuojie
    Song, Ping
    Zhao, Yujun
    Su, Hongjiu
    APPLIED SURFACE SCIENCE, 2025, 692
  • [44] Chemical Mechanical Polishing for Oxygen Free Copper with Manganese Oxide Abrasives
    Sato, Ryunosuke
    Ichida, Yoshio
    Morimoto, Yoshitaka
    Shimizu, Kenji
    JOURNAL OF ADVANCED MECHANICAL DESIGN SYSTEMS AND MANUFACTURING, 2008, 2 (04): : 685 - 693
  • [45] Design of composite abrasives and substrate materials for chemical mechanical polishing applications
    Meng, Fanning
    Zhang, Zhenyu
    Gao, Peili
    Liu, Tingting
    Boyjoo, Yash
    Guo, Dongming
    APPLIED NANOSCIENCE, 2020, 10 (05) : 1379 - 1393
  • [46] Chemical-mechanical polishing performance of core-shell structured polystyrene@ceria/nanodiamond ternary abrasives on sapphire wafer
    Zhou, Chen
    Xu, Xiangyang
    Dai, Lei
    Gong, Haiming
    Lin, Shuntian
    CERAMICS INTERNATIONAL, 2021, 47 (22) : 31691 - 31701
  • [47] Advanced Atomic-scale Insights into the Chemical Mechanical Polishing Process with Ceria Abrasives using Molecular Dynamics and Neural Network Potential
    Okuno, Yoshishige
    Hirakawa, Teruo
    Ota, Fukiko
    Kurata, Yuuto
    Orita, Akihiro
    Nomura, Satoyuki
    PROCEEDINGS OF THE IEEE 74TH ELECTRONIC COMPONENTS AND TECHNOLOGY CONFERENCE, ECTC 2024, 2024, : 1251 - 1255
  • [48] Novel ceria-polymer microcomposites for chemical mechanical polishing
    Coutinho, Cecil A.
    Mudhivarthi, Subrahmanya R.
    Kumar, Ashok
    Gupta, Vinay K.
    APPLIED SURFACE SCIENCE, 2008, 255 (05) : 3090 - 3096
  • [49] Ceria concentration effect on chemical mechanical polishing of optical glass
    Wang, Liangyong
    Zhang, Kailiang
    Song, Zhitang
    Feng, Songlin
    APPLIED SURFACE SCIENCE, 2007, 253 (11) : 4951 - 4954
  • [50] Samarium-Doped Ceria Nanospheres Prepared via Solvothermal Method and the Chemical Mechanical Polishing Properties
    Wang, Zhenyang
    Wang, Tongqing
    Lu, Xinchun
    ELECTRONIC MATERIALS LETTERS, 2025, 21 (02) : 252 - 259
12345