Determination of dislocation density in GaN/sapphire layers using XRD measurements carried out from the edge of the sample

被引:0
|
作者
Serafińczuk, Jaroslaw [1 ,2 ]
Moszak, Karolina [1 ]
Pawlaczyk, Lukasz [2 ]
Olszewski, Wojciech [1 ]
Pucicki, Damian [1 ,2 ]
Kudrawiec, Robert [1 ,3 ]
Hommel, Detlef [1 ,4 ]
机构
[1] LUKASIEWICZ Research Network, PORT Polish Center for Technology Development, Stablowicka 147, Wroclaw,54-066, Poland
[2] Department of Nanometrology, Wroclaw University of Science and Technology, Janiszewskiego 11/17, Wroclaw,50-372, Poland
[3] Department of Semiconductor Materials Engineering, Wroclaw University of Science and Technology, Wybrzeze Wyspianskiego 27, Wroclaw,50-370, Poland
[4] Institute of Experimental Physics, University of Wroclaw, Pl. Maxa Borna 9, Wroclaw,50-204, Poland
来源
关键词
D O I
暂无
中图分类号
学科分类号
摘要
Journal article (JA)
引用
收藏
相关论文
共 34 条