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- [22] Effect of additives on hole filling characteristics of electroless copper plating JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2004, 43 (10): : 7000 - 7001
- [23] Numerical Simulation and Experimental Verification of Copper Plating with Different Additives for Through Silicon Vias 2012 4TH ELECTRONIC SYSTEM-INTEGRATION TECHNOLOGY CONFERENCE (ESTC), 2012,
- [24] Synergistic Effects of Additives on the Filling Process of High-Aspect-Ratio TSV - Kinetic Monte Carlo Simulation PROCESSING MATERIALS OF 3D INTERCONNECTS, DAMASCENE AND ELECTRONICS PACKAGING 4, 2013, 50 (32): : 41 - 55
- [30] Investigations on via geometry and wetting behavior for the filling of Through Silicon Vias by copper electro deposition ADVANCED METALLIZATION CONFERENCE 2007 (AMC 2007), 2008, 23 : 623 - 630