Low breakdown voltage and CMOS compatible avalanche photodiode based on SOI substrate

被引:0
|
作者
Xu, Hang [1 ,2 ]
Feng, Tianyang [1 ]
Guo, Jianbin [1 ]
Yang, Yafen [1 ,2 ,3 ]
Zhang, David Wei [1 ,2 ,3 ]
机构
[1] Fudan Univ, Sch Microelect, Shanghai 200433, Peoples R China
[2] Natl Integrated Circuit Innovat Ctr, Shanghai 200433, Peoples R China
[3] Jiashan Fudan Inst, Jiaxing 314100, Zhejiang, Peoples R China
基金
中国国家自然科学基金;
关键词
HIGH-SPEED; PHOTODETECTORS; RING;
D O I
10.1364/OL.528915
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
In this work, we present a novel, to the best of our knowledge, lateral avalanche photodiode (APD) with low breakdown voltage and high bandwidth which has the potential to serve as a core device in future large-scale advanced optoelectronic hybrid chips. By taking advantage of a silicon-on-insulator (SOI) substrate combined with a separation absorption multiplier (SAM) structure, the demonstrated APDs exhibit a high gain of 148. Furthermore, the minimum breakdown voltage of the measured device is 6.1 V, which represents the lowest breakdown voltage for Si-APD, making it compatible with the existing CMOS technology for low voltage operation. Benefiting from an ultra-thin top silicon and lateral SAM structure, the problem of edge breakdown has been completely solved. Additionally, a set of device arrays with absorption and avalanche regions of different sizes is also manufactured and compared. Our findings indicate that the proposed APD has fascinating application prospects in the CMOS process-based LIDAR chips. (c) 2024 Optica Publishing Group. All rights, including for text and data mining (TDM), Artificial Intelligence (AI) training, and similar technologies, are reserved.
引用
收藏
页码:4310 / 4313
页数:4
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