Ferromagnetic manganese silicide nanoparticles formed by ion implantation in silicon

被引：0
|
作者：
Ohsugi, R. [1 ]
Kawano, M. [1 ]
Wakabayashi, Y. K. [1 ]
Krockenberger, Y. [1 ]
Sumikura, H. [1 ]
Noborisaka, J. [1 ]
Nishiguchi, K. [1 ]
机构：
[1] NTT Corp, NTT Basic Res Labs, Tokyo, Japan
来源：
2024 IEEE SILICON NANOELECTRONICS WORKSHOP, SNW 2024 | 2024年
关键词：
ion-implantation; silicide; magnetism;
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学科分类号：
摘要：
Manganese silicide nanoparticles (NPs) embedded in silicon were fabricated by an ion implantation method with various manganese ion acceleration energies (E-acc). The NPs were single crystalline with a tetragonal structure and exhibited ferromagnetic properties below the blocking temperature (T-B), at which the magnetization of NPs starts to fall into a metastable state and becomes fixed. T-B increased as E-acc increased. On the basis of Neel's relaxation theory, we revealed that this dependence originates from the influence of E-acc on the particle sizes.
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页码：73 / 74
页数：2
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