Sputtering of titanium and tungsten carbide films from the surface titanium and tungsten by helium ions of medium energies bombardment

被引：0
|
作者：
Manukhin V.V. [1 ]
机构：
[1] National Research University "MPEI", 14 Krasnokazarmennaya st., Moscow
来源：
Applied Physics | 2022年 / 03期
关键词：
ion bombardment; layered surface; light ions; metal carbide; modified surface; partial sputtering yield; sputtering; sputtering yield;
D O I：
10.51368/1996-0948-2022-3-67-72
中图分类号：
学科分类号：
摘要：
The analytical model of sputtering of binary layered inhomogeneous targets is applied to the case of sputtering of metal carbide films from the metal surface with helium ions. On the basis of the model, an analytical formula was obtained that allows to calculate the complete and partial sputtering yields of inhomogeneous targets by light ions. The calculation results of the total sputtering yields of titanium and tungsten carbide films from the surface of metals by helium ions are given in comparison with the results of computer simulation. © 2022 Federal Informational-Analytical Center of the Defense Industry. All rights reserved.
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页码：67 / 72
页数：5
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