4H-SiC Schottky barrier diodes with semi-insulating polycrystalline silicon field plate termination

被引:0
|
作者
袁昊 [1 ]
汤晓燕 [1 ]
张义门 [1 ]
张玉明 [1 ]
宋庆文 [2 ]
杨霏 [3 ]
吴昊 [3 ]
机构
[1] School of Microelectronics,Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices,Xidian University
[2] School of Advanced Materials and Nanotechnology,Xidian University
[3] The National Smart Grid Research Institute
基金
中国国家自然科学基金;
关键词
4H-SiC; Schottky-barrier diodes; semi-insulating polycrystalline silicon; field plates termination;
D O I
暂无
中图分类号
O441 [电磁学];
学科分类号
0809 ;
摘要
Based on the theoretical analysis of the 4H-SiC Schottky-barrier diodes(SBDs) with field plate termination, 4H-SiC SBD with semi-insulating polycrystalline silicon(SIPOS) FP termination has been fabricated. The relative dielectric constant of the SIPOS dielectric first used in 4H-SiC devices is 10.4, which is much higher than that of the SiO2dielectric,leading to benefitting the performance of devices. The breakdown voltage of the fabricated SBD could reach 1200 V at leakage current 20 μA, about 70% of the theoretical breakdown voltage. Meanwhile, both of the simulation and experimental results show that the length of the SIPOS FP termination is an important factor for structure design.
引用
收藏
页码:465 / 468
页数:4
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