Enhanced absorption process in the thin active region of GaAs based p–i–n structure

被引:1
|
作者
岳琛 [1 ,2 ,3 ]
唐先胜 [1 ,2 ,3 ]
李阳锋 [1 ]
王文奇 [1 ]
李欣欣 [1 ,2 ,3 ]
张珺玚 [1 ,2 ,3 ]
邓震 [1 ]
杜春花 [1 ]
贾海强 [1 ,3 ,4 ]
王文新 [1 ,3 ,4 ]
陆卫 [5 ]
江洋 [1 ]
陈弘 [1 ,3 ,4 ]
机构
[1] Key Laboratory for Renewable Energy, Beijing Key Laboratory for New Energy Materials and Devices,Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences
[2] University of Academy of Sciences
[3] Center of Material and Optoelectronics Engineering, University of Academy of Sciences
[4] Songshan Lake Material Laboratory
[5] State Key Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences
基金
中国国家自然科学基金;
关键词
D O I
暂无
中图分类号
TB34 [功能材料];
学科分类号
080501 ;
摘要
The optical absorption is the most important macroscopic process to characterize the microscopic optical transition in the semiconductor materials. Recently, great enhancement has been observed in the absorption of the active region within a p–n junction. In this paper, Ga As based p–i–n samples with the active region varied from 100 nm to 3 μm were fabricated and it was observed that the external quantum efficiencies are higher than the typical results, indicating a new mechanism beyond the established theories. We proposed a theoretical model about the abnormal optical absorption process in the active region within a strong electric field, which might provide new theories for the design of the solar cells,photodetectors, and other photoelectric devices.
引用
收藏
页码:534 / 538
页数:5
相关论文
共 50 条
  • [41] Saturation of absorption in n-i-p-i crystals
    Ushakov, DV
    Konenenko, VK
    Manak, IS
    OPTICS OF CRYSTALS, 2001, 4358 : 171 - 174
  • [42] Absorption properties of GaAsBi based p-i-n heterojunction diodes
    Zhou, Zhize
    Mendes, Danuta F.
    Richards, Robert D.
    Bastiman, Faebian
    David, John P. R.
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2015, 30 (09)
  • [43] Recombination of Charge Carriers in the GaAs-Based p-i-n Diode
    Ayzenshtat, G. I.
    Yushenko, A. Y.
    Gushchin, S. M.
    Dmitriev, D. V.
    Zhuravlev, K. S.
    Toropov, A. I.
    SEMICONDUCTORS, 2010, 44 (10) : 1362 - 1364
  • [44] Recombination of charge carriers in the GaAs-based p-i-n diode
    G. I. Ayzenshtat
    A. Y. Yushenko
    S. M. Gushchin
    D. V. Dmitriev
    K. S. Zhuravlev
    A. I. Toropov
    Semiconductors, 2010, 44 : 1362 - 1364
  • [45] GAAS LIGHT-EMITTING-DIODES WITH N-I-P-I ACTIVE LAYERS FABRICATED BY SELECTIVE CONTACT DIFFUSION
    ACKLEY, DE
    MANTZ, J
    LEE, H
    NOURI, N
    SHIEH, CL
    APPLIED PHYSICS LETTERS, 1988, 53 (02) : 125 - 127
  • [46] PHOTOSENSITIVITY OF THE EPITAXIAL STRUCTURE P-GAAS/N-GAAS/P-SI
    IVANYUTIN, LA
    KATSAPOV, FM
    RAKHLEI, SY
    TSYPLENKOV, IN
    SEMICONDUCTORS, 1995, 29 (10) : 914 - 916
  • [47] Electronic structure and photoemission spectra of thin (GaAs)n(AlAs)n superlattices
    Bartos, I
    Strasser, T
    Schattke, W
    SURFACE SCIENCE, 2002, 507 : 160 - 164
  • [48] Amorphous silicon based p-i-i-n structure for color sensor
    Zhang, S
    Raniero, L
    Fortunato, E
    Pereira, L
    Aguas, H
    Ferreira, L
    Martins, R
    Amorphous and Nanocrystalline Silicon Science and Technology-2005, 2005, 862 : 679 - 683
  • [49] Analysis of photocurrent in the i-layer of GaAs-based n-i-p solar cell
    Belghachi, Abderrahmane
    Helmaoui, Abderrachid
    SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2006, 90 (12) : 1721 - 1733
  • [50] Ultraviolet photodetectors based on GaN with p-i-n structure
    College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing 100022, China
    Bandaoti Guangdian, 2007, 1 (33-35):